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SEM contour-based model OPC calibrated with optically sensitive patterns

Author(s):
  • J.-E. Jung ( Samsung Electronics Co., Ltd., South Korea )
  • M.-K. Lee ( Samsung Electronics Co., Ltd., South Korea )
  • Y.-J. Cho ( Samsung Electronics Co., Ltd., South Korea )
  • S.-H. Lee ( Samsung Electronics Co., Ltd., South Korea )
  • Y.-S. Kang ( Samsung Electronics Co., Ltd., South Korea )
Publication title:
Design for manufacturability through design-process integration II : 28-29 February 2008, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6925
Pub. Year:
2008
Page(from):
692516-1
Page(to):
692516-10
Pages:
10
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471109 [0819471100]
Language:
English
Call no.:
P63600/6925
Type:
Conference Proceedings

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