A simulation study on the impact of lithographic process variations on CMOS device performance

A simulation study on the impact of lithographic process variations on CMOS device performance

Author(s):

T. Fühner ( Fraunhofer Institute of Integrated Systems and Device Technology, Germany )
C. Kampen ( Fraunhofer Institute of Integrated Systems and Device Technology, Germany )
I. Kodrasi ( Jacobs Univ., Germany )
A. Burenkov ( Fraunhofer Institute of Integrated Systems and Device Technology, Germany )
A. Erdmann ( Fraunhofer Institute of Integrated Systems and Device Technology, Germany )

Publication title:

Optical Microlithography XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6924

Pub. Year:

2008

Vol.:

3

Page(from):

692453-1

Page(to):

692453-12

Pages:

12

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471093 [0819471097]

Language:

English

Call no.:

P63600/6924

Type:

Conference Proceedings

Details

TDL ID:	ZA00052555
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2008 : 21st
Conf. info. (Venue):	San Jose, California, USA
Conf. info. (Date):	2008.02.26-2008.02.29
Note for article:	Optical Microlithography XXI, 26-29 February 2008, San Jose, California, USA. Poster Session: Simulation, 692453, 6924-197

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