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Integration of high-speed surface-channel charge coupled devices into an SOI CMOS process using strong phase shift lithography

Author(s):
  • J. Knecht ( Massachusetts Institute of Technology, USA )
  • V. Bolkhovsky ( Massachusetts Institute of Technology, USA )
  • J. Sage ( Massachusetts Institute of Technology, USA )
  • B. Tyrrell ( Massachusetts Institute of Technology, USA )
  • B. Wheeler ( Massachusetts Institute of Technology, USA )
Publication title:
Optical Microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6924
Pub. Year:
2008
Vol.:
3
Page(from):
69244R-1
Page(to):
69244R-10
Pages:
10
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471093 [0819471097]
Language:
English
Call no.:
P63600/6924
Type:
Conference Proceedings

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