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Resolution enhancement techniques in 65 nm node nested-hole patterning

Author(s):
  • H. Lee ( DongbuHiTek, South Korea )
  • J. Choi ( DongbuHiTek, South Korea )
  • J. Kim ( DongbuHiTek, South Korea )
  • J.-W. Han ( DongbuHiTek, South Korea )
  • K.-Y. Kim ( International Technology Alliances, Inc., USA )
Publication title:
Optical Microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6924
Pub. Year:
2008
Vol.:
3
Page(from):
69244B-1
Page(to):
69244B-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471093 [0819471097]
Language:
English
Call no.:
P63600/6924
Type:
Conference Proceedings

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