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Evaluation of inverse lithography technology for 55nm-node memory device

Author(s):
  • B. Cho ( Hynix Semiconductor, Inc., South Korea )
  • S. Ko ( Hynix Semiconductor, Inc., South Korea )
  • J. Choi ( Hynix Semiconductor, Inc., South Korea )
  • C.-K. Kim ( Hynix Semiconductor, Inc., South Korea )
  • H. Yang ( Hynix Semiconductor, Inc., South Korea )
Publication title:
Optical Microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6924
Pub. Year:
2008
Vol.:
2
Page(from):
692438-1
Page(to):
692438-7
Pages:
7
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471093 [0819471097]
Language:
English
Call no.:
P63600/6924
Type:
Conference Proceedings

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