45nm node logic device OPE matching between exposure tools through laser bandwidth tuning

45nm node logic device OPE matching between exposure tools through laser bandwidth tuning

Author(s):

K. Yoshimochi ( NEC Electronics Corp., Japan )
T. Tamura ( NEC Electronics Corp., Japan )
S. Nagahara ( NEC Electronics Corp., Japan )
T. Uchiyama ( NEC Electronics Corp., Japan )
N. Farrar ( Cymer, Inc., USA )

Publication title:

Optical Microlithography XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6924

Pub. Year:

2008

Vol.:

2

Page(from):

69242K-1

Page(to):

69242K-12

Pages:

12

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471093 [0819471097]

Language:

English

Call no.:

P63600/6924

Type:

Conference Proceedings

Details

TDL ID:	ZA00052555
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2008 : 21st
Conf. info. (Venue):	San Jose, California, USA
Conf. info. (Date):	2008.02.26-2008.02.29
Note for article:	Optical Microlithography XXI, 26-29 February 2008, San Jose, California, USA. Poster Session: Lithography Tools, 69242K, 6924-92

Similar Items:

1 Conference Proceedings Study of iso-dense bias (IDB) sensitivity to laser spectral shape at the 45nm node K. Yoshimochi, T. Uchiyama, T. Tamura, T. Theeuwes, R. Peeters, H. van der Laan, H. Bakker, K. Morisaki, T. Oga SPIE - The International Society of Optical Engineering	7 Conference Proceedings Performance of immersion lithography for 45-nm-node CMOS and ultra-high density SRAM with 0.25um2 S. Mimotogi, F. Uesawa, M. Tominaga, H. Fujise, K. Sho, M. Katsumata, H. Hane, A. Ikegami, S. Nagahara, T. Ema, M. … SPIE - The International Society of Optical Engineering
2 Conference Proceedings Benefit of ArF immersion lithography in 55 nm logic device manufacturing T. Uchiyama, T. Tamura, K. Yoshimochi, P. Graupner, H. Bakker, E. van Setten, K. Morisaki SPIE - The International Society of Optical Engineering	8 Conference Proceedings The application of SMASH alignment system for 65-55-nm logic devices M. Miyasaka, H. Saito, T. Tamura, T. Uchiyama, P. Hinnen, H. Lee, M. van Kemenade, M. Shahrjerdy, R. van Leeuwen SPIE - The International Society of Optical Engineering
3 Conference Proceedings Effects of laser bandwidth on OPE in a modern lithography tool [6154-36] Huggins, K., Tsuyoshi, T., Ong, M., Rafac, R., Treadway, C., Choudhary, D., Kudo, T., Hirukawa, S., Renwick, S. P., … SPIE - The International Society of Optical Engineering	9 Conference Proceedings Electron-beam mask writer EBM-6000 for 45 nm HP node J. Yashima, K. Ohtoshi, N. Nakayamada, H. Anze, T. Katsumata, T. Iijima, R. Nishimura, S. Fukutome, N. Miyamoto, S. … SPIE - The International Society of Optical Engineering
4 Conference Proceedings Evaluation of immersion lithography processes for 55-nm node logic devices T. Nakata, T. Kodama, M. Komori, N. Onoda, T. Uchiyama SPIE - The International Society of Optical Engineering	10 Conference Proceedings New inline AFM metrology tool suited for LSI manufacturing at the 45-nm node and beyond M. Edamura, Y. Kunitomo, T. Morimoto, S. Sekino, T. Kurenuma, Y. Kembo, M. Watanabe, S. Baba, K. Hidaka SPIE - The International Society of Optical Engineering
5 Conference Proceedings Improvement of gate CD uniformity for55 nm node logic devices T. Murakami, T. Nakata, K. Taniguchi, T. Uchiyama, M. Jyousaka Society of Photo-optical Instrumentation Engineers	11 Conference Proceedings Immersion defectivity study with volume production immersion lithography tool for 45 nm node and below K. Nakano, S. Nagaoka, M. Yoshida, Y. Iriuchijima, T. Fujiwara Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Concurrent development methodology from design rule to OPC in 45-nm node logic device K. Konomi, S. Nojima, S. Maeda, T. Fujimaki, H. Igarashi Society of Photo-optical Instrumentation Engineers	12 Conference Proceedings Immersion resist process for 32-nm node logic devices T. Ema, K. Sho, H. Yonemitsu, Y. Seino, H. Fujise Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12