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Double patterning in lithography for 65nm node with oxidation process

Author(s):
  • E. Jeong ( DongbuHiTek, South Korea )
  • J. Kim ( DongbuHiTek, South Korea )
  • K. Choi ( DongbuHiTek, South Korea )
  • M. Lee ( DongbuHiTek, South Korea )
  • D. Lee ( DongbuHiTek, South Korea )
Publication title:
Optical Microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6924
Pub. Year:
2008
Vol.:
2
Page(from):
692424-1
Page(to):
692424-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471093 [0819471097]
Language:
English
Call no.:
P63600/6924
Type:
Conference Proceedings

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