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45nm and 32nm half-pitch patterning with 193nm dry lithography and double patterning

Author(s):
  • H. Dai ( Applied Materials, Inc., USA )
  • C. Bencher ( Applied Materials, Inc., USA )
  • Y. Chen ( Applied Materials, Inc., USA )
  • H. Woo ( Applied Materials, Inc., USA )
  • C. Ngai ( Applied Materials, Inc., USA )
Publication title:
Optical Microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6924
Pub. Year:
2008
Vol.:
2
Page(from):
692421-1
Page(to):
692421-7
Pages:
7
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471093 [0819471097]
Language:
English
Call no.:
P63600/6924
Type:
Conference Proceedings

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