Blank Cover Image

A comprehensive comparison between double patterning and double patterning with spacer on sub-50nm product implementation

Author(s):
  • C. F. Tseng ( Macronix International Co., Ltd., Taiwan )
  • C. C. Yang ( Macronix International Co., Ltd., Taiwan )
  • E. Yang ( Macronix International Co., Ltd., Taiwan )
  • T. H. Yang ( Macronix International Co., Ltd., Taiwan )
  • K. C. Chen ( Macronix International Co., Ltd., Taiwan )
Publication title:
Optical Microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6924
Pub. Year:
2008
Vol.:
2
Page(from):
69241Y-1
Page(to):
69241Y-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471093 [0819471097]
Language:
English
Call no.:
P63600/6924
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Spacer double patterning technique for sub-40nm DRAM manufacturing process development

W. Shiu, W. Ma, H. W. Lee, J. S. Wu, Y. M. Tseng

Society of Photo-optical Instrumentation Engineers
7 Conference Proceedings 65-nm full-chip implementation using double dipole lithography

Hsu, S.D., Chen, J.F., Cororan, N., Knose, W.T., Broeke, D.J.V.D., Laidig, T.L., Wampler, K.E., Shi, X., Hsu, C.M., …

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Process capability comparison between LELE DPT and spacer for NAND flash 32nm and below

S. Tseng, A. C. Chen

Society of Photo-optical Instrumentation Engineers
8 Conference Proceedings Experimental methodology of contact edge roughness on sub-100-nm pattern

Lee, T.Y., Ihm, D., Kang, H.C., Lee, J.B., Lee, B.-H., Chin, S.-B., Cho, D.-H., Kim, Y.H., Yang, H.D., Yang, K.M.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Feasibility study of splitting pitch technology on 45-nm contact patterning with 0.93 NA

Y. F. Cheng, Y. L. Chou, T. C. Tseng, B. Y. Hsueh, C. H. Yang

SPIE - The International Society of Optical Engineering
9 Conference Proceedings 22nm half-pitch patterning by CVD spacer self alignment double patterning (SADP)

C. Bencher, Y. Chen, H. Dai, W. Montgomery, L. Huli

Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Extension of KrF lithography to sub-50-nm pattern formation

Nakao,S., Itoh,J., Nakae,A., Kanai,I., Saitoh,T., Matsubara,H., Tsujita,K., Arimoto,I., Wakamiya,W.

SPIE - The International Society for Optical Engineering
10 Conference Proceedings Positive and negative tone double patterning lithography for 50nm flash memory [6154-37]

Lim, C. M., Kim, S. M., Hwang, Y. S., Choi, J. -S., Ban, K. -D., Cho, S. -Y., Jung, J. K., Knag, E. -K., Lim, H. -Y., …

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Implementing AAPSM in 90-nm product with practical image imbalance correction

Lin, B.S., Hsu, S.-, Huang, I.H., Chen, K., Hsieh, F., Hsu, T., Liu, H.-Y., Kroyan, A., Hsu, F., Huang, J.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50]

Hsu, M., Van Den Broeke, D., Laidig, T., Wampler, K. E., Hollerbach, U., Socha, R., Chen, J. F., Hsu, S., Shi, X.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Realization of sub-80-nm small-space patterning in ArF photolithography

Kim, S.-H., Kim, H.-D., Lee, S.-H., Park, C.-M., Ryoo, M.-H., Yeo, G.-S., Lee, J.-H., Cho, H.-K., Han, W.-S., Moon, …

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Full-chip pitch/pattern splitting for lithography and spacer double patterning technologies

T.-B. Chiou, R. Socha, H.-Y. Kang, A. C. Chen, S. Hsu

Society of Photo-optical Instrumentation Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12