Tool-to-tool optical proximity effect matching

Tool-to-tool optical proximity effect matching

Author(s):

L. Van Look ( IMEC vzw, Belgium )
J. Bekaert ( IMEC vzw, Belgium )
P. De Bisschop ( IMEC vzw, Belgium )
J. Van de Kerkhove ( IMEC vzw, Belgium )
G. Vandenberghe ( IMEC vzw, Belgium )

Publication title:

Optical Microlithography XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6924

Pub. Year:

2008

Vol.:

2

Page(from):

69241Q-1

Page(to):

69241Q-12

Pages:

12

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471093 [0819471097]

Language:

English

Call no.:

P63600/6924

Type:

Conference Proceedings

Details

TDL ID:	ZA00052555
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2008 : 21st
Conf. info. (Venue):	San Jose, California, USA
Conf. info. (Date):	2008.02.26-2008.02.29
Note for article:	Optical Microlithography XXI, 26-29 February 2008, San Jose, California, USA. Session 13. Lithography Tools I, 69241Q, 6924-61

Similar Items:

1 Conference Proceedings Experimental proximity matching of ArF scanners J. Bekaert, L. Van Look, P. De Bisschop, J. Van de Kerkhove, G. Vandenberghe Society of Photo-optical Instrumentation Engineers	7 Conference Proceedings Process, design and optical proximity correction requirements for the 65nm device generation Lucas, K., Montgomery, P., Litt, L.C., Conley, W., Postnikov, S.V., Wu, W., Yuan, C.-M., Olivares, M., Strozewski, K., … SPIE-The International Society for Optical Engineering
2 Conference Proceedings Empirical study of OPC metrology requirements for 32-nm node logic B. S. Ward, L. Zavylova, P. de Bisschop, J. van de Kerkhove Society of Photo-optical Instrumentation Engineers	8 Conference Proceedings Optical detection of the superconducting proximity effect Greene,L.H., Abeyta,A.C., Roshchin,I.V., Robinson,I.K., Dorsten,J.F., Tanzer,T.A., Bohn,P.W. SPIE-The International Society for Optical Engineering
3 Conference Proceedings 60nm half pitch contact layer printing: exploring the limits at 1.35NA lithography J. Bekaert, E. Hendrickx, G. Vandenberghe Society of Photo-optical Instrumentation Engineers	9 Conference Proceedings Experimental evaluation of bull’s-eye illumination for csslst-free random contact printing at sub-65nm node [6154-39] Finders, J., Engelen, A., Vandenberghe, G., Bekaert, J., Chen, T. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Optical proximity effects correction at 0.25ｦﾌm incorporating process variations in lithography Tritchkov,A., Rieger,M.L., Stirniman,J.P., Yen,A., Ronse,K., Vandenberghe,G., hove,L.Van den SPIE-The International Society for Optical Engineering	10 Conference Proceedings Proximity-bias swing: origin and characterization Zandbergen,P., Gehoel-van,Ansem,W., de Klerk,J., Vandenberghe,G., Linskens,F. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Mask topography effect in chromeless phase lithography Philipsen, V., Bekaert, J., Vandenberghe, G., Jonckheere, R., Van Den Broeke, D., Socha, R. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Optical proximity correction: a first look at manufacturability L.W. Liebmann, B.J. Grenon, M.A. Lavin, S. Schomody, T. Zell Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Process, design, and optical proximity correction requirements for the 65-nm device generation Lucas, K., Montgomery, P., Litt, L.C., Conley, W., Postnikov, S.V., Wu, W., Yuan, C.-M., Olivares, M., Strozewski, K., … SPIE-The International Society for Optical Engineering	12 Conference Proceedings Compensating mask topography effects in CPL through-pitch solutions toward the 45nm node [5992-61] Bekaert, J., Philipsen, V., Vandenberghe, G., van den Broeke, D., Degel, W., Zibold, A. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12