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Optimization of BARC process for hyper-NA immersion lithography

Author(s):
  • K. Lee ( Hynix Semiconductor Inc., South Korea )
  • J. Lee ( Hynix Semiconductor Inc., South Korea )
  • S. Lee ( Hynix Semiconductor Inc., South Korea )
  • D. Park ( Hynix Semiconductor Inc., South Korea )
  • C. Bok ( Hynix Semiconductor Inc., South Korea )
Publication title:
Advances in resist materials and processing technology XXV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6923
Pub. Year:
2008
Vol.:
2
Page(from):
69232R-1
Page(to):
69232R-9
Pages:
9
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471086 [0819471089]
Language:
English
Call no.:
P63600/6923
Type:
Conference Proceedings

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