Highly hydrophobic materials for ArF immersion lithography
- Author(s):
- Y. Takebe ( Asahi Glass Co., Ltd., Japan )
- N. Shirota ( Asahi Glass Co., Ltd., Japan )
- T. Sasaki ( Asahi Glass Co., Ltd., Japan )
- K. Murata ( Asahi Glass Co., Ltd., Japan )
- O. Yokokoji ( Asahi Glass Co., Ltd., Japan )
- Publication title:
- Advances in resist materials and processing technology XXV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6923
- Pub. Year:
- 2008
- Vol.:
- 1
- Page(from):
- 69231U-1
- Page(to):
- 69231U-9
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819471086 [0819471089]
- Language:
- English
- Call no.:
- P63600/6923
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
2
Conference Proceedings
Development of new resist materials for 193-nm dry and immersion lithography [6153-15]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Development of non-topcoat resist polymers for 193-nm immersion lithography
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
High refractive index materials design for the next generation ArF immersion lithography
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |