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Adamantane-based molecular gloss resist for 193-nm lithography and beyond

Author(s):
  • S. Tanaka ( Idemitsu Kosan Co., Ltd., Japan )
  • N. Matsumoto ( Idemitsu Kosan Co., Ltd., Japan )
  • H. Ohno ( Idemitsu Kosan Co., Ltd., Japan )
  • N. Hatakeyama ( Idemitsu Chemicals U.S.A. Corp., USA )
  • K. Ito ( Idemitsu Kosan Co., Ltd., Japan )
Publication title:
Advances in resist materials and processing technology XXV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6923
Pub. Year:
2008
Vol.:
1
Page(from):
69231J-1
Page(to):
69231J-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471086 [0819471089]
Language:
English
Call no.:
P63600/6923
Type:
Conference Proceedings

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