Development of an operational high refractive index resist for 193nm immersion lithography
- Author(s):
- P. A. Zimmerman ( SEMATECH, USA )
- J. Byers ( SEMATECH, USA )
- E. Piscani ( SEMATECH, USA )
- B. Rice ( SEMATECH, USA )
- C. K. Ober ( Cornell Univ., USA )
- Publication title:
- Advances in resist materials and processing technology XXV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6923
- Pub. Year:
- 2008
- Vol.:
- 1
- Page(from):
- 692306-1
- Page(to):
- 692306-10
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819471086 [0819471089]
- Language:
- English
- Call no.:
- P63600/6923
- Type:
- Conference Proceedings
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