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Wide applications of design based metrology with tool integration

Author(s):
  • H. Yang ( Hynix Semiconductor,INC., South Korea )
  • J. Kim ( Hynix Semiconductor,INC., South Korea )
  • A. Jung ( Hynix Semiconductor,INC., South Korea )
  • T. Lee ( Hynix Semiconductor,INC., South Korea )
  • D. Yim ( Hynix Semiconductor,INC., South Korea )
Publication title:
Metrology, inspection, and process control for microlithography XXII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6922
Pub. Year:
2008
Vol.:
2
Page(from):
692239-1
Page(to):
692239-7
Pages:
7
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471079 [0819471070]
Language:
English
Call no.:
P63600/6922
Type:
Conference Proceedings

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