Diffraction based overlay metrology for α-carbon applications

Diffraction based overlay metrology for α-carbon applications

Author(s):

C. S. Saravanan ( Nanometrics ,INC., USA )
A. Tan ( Nanometrics ,INC., USA )
P. Dasari ( Nanometrics ,INC., USA )
G. Goelzer ( Nanometrics ,INC., USA )
N. Smith ( Nanometrics ,INC., USA )

Publication title:

Metrology, inspection, and process control for microlithography XXII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6922

Pub. Year:

2008

Vol.:

2

Page(from):

69222W-1

Page(to):

69222W-12

Pages:

12

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471079 [0819471070]

Language:

English

Call no.:

P63600/6922

Type:

Conference Proceedings

Details

TDL ID:	ZA00052553
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2008 : 22nd
Conf. info. (Venue):	San Jose, California, USA
Conf. info. (Date):	2008.02.25-2008.02.28
Note for article:	Metrology, inspection, and process control for microlithography XXII, San Jose, California, USA, 25-28 February 2008 - Poster Session (69222W/6922-108)

Similar Items:

1 Conference Proceedings Evaluating diffraction based overlay metrology for double patterning technologies C. S. Saravanan, Y. Liu, P. Dasari, O. Kritsun, C. Volkman Society of Photo-optical Instrumentation Engineers	7 Conference Proceedings In-chip overlay metrology for 45nm processes Y. S. Ku, H. L. Pang, N. P. Smith, L. Binns SPIE - The International Society of Optical Engineering
2 Conference Proceedings Overlay metrology tool calibration L. A. Binns, P. Dasari, N. P. Smith, G. Ananew, H. Fink, C. P. Ausschnitt, J. Morningstar, C. Thomison, R. J. Yerdon SPIE - The International Society of Optical Engineering	8 Conference Proceedings Overlay metrology at the crossroads N. P. Smith, L. A. Binns, A. Plambeck, K. Heidrich Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Blossom overlay metrology implementation C. P. Ausschnitt, W. Chu, D. Kolor, J. Morillo, J. L. Morningstar, W. Muth, C. Thomison, R. J. Yerdon, L. A. Binns, P. … SPIE - The International Society of Optical Engineering	9 Conference Proceedings Using in-chip overlay metrology S. Girol-Gunia, B. Schulz, N. Smith, L. Binns Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Overlay metrology tool calibration using blossom L. A. Binns, N. P. Smith, P. Dasari Society of Photo-optical Instrumentation Engineers	10 Conference Proceedings In-chip overlay metrology of 45nm and 55nm processes Y. S. Ku, C. H. Tung, Y. P. Li, H. L. Pang, C. M. Ke, Y. H. Wang, D. C. Huang, N. P. Smith, L. Binns SPIE - The International Society of Optical Engineering
5 Conference Proceedings In-chip overlay metrology [6152-40] Ku, Y. S., Tung, C. H., Li, Y. P., Pang, H. L., Smith, N. P., Binns, L., Rigden, T., Reynolds, G., Fink, H. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Multi-patterning overlay control C. P. Ausschnitt, P. Dasari Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Effects of illumination wavelength on the accuracy of optical overlay metrology Han,J.-S., Kim,H., Nam,J.-L., Han,M.-S., Lim,S.-K., Yanowitz,S.D., Smith,N.P., Smout,A.M.C. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Multi-layer overlay metrology [6152-36] Ausschnitt, C. P., Morningstar, J., Muth, W., Schneider, J., Yerdon, R. J., Binns, L. A., Smith, N. P. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12