Sampling for advanced overlay process control

Sampling for advanced overlay process control

Author(s):

D. Choi ( KLA-Tencor Korea Co.,Ltd., South Korea )
P. lzikson ( KLA-Tencor Corp., Israel )
D. Sutherland ( KLA-Tencor Corp., USA )
K. Sherman ( KLA-Tencor Corp., USA )
J. Manka ( KLA-Tencor Corp., USA )

Publication title:

Metrology, inspection, and process control for microlithography XXII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6922

Pub. Year:

2008

Vol.:

2

Page(from):

69222U-1

Page(to):

69222U-8

Pages:

8

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471079 [0819471070]

Language:

English

Call no.:

P63600/6922

Type:

Conference Proceedings

Details

TDL ID:	ZA00052553
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2008 : 22nd
Conf. info. (Venue):	San Jose, California, USA
Conf. info. (Date):	2008.02.25-2008.02.28
Note for article:	Metrology, inspection, and process control for microlithography XXII, San Jose, California, USA, 25-28 February 2008 - Poster Session (69222U/6922-105)

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