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Alignment system and process optimization for improvement of double patterning overlay

Author(s):
  • W. Ma ( Hynix Semiconductor,INC., South Korea )
  • J. Kang ( Hynix Semiconductor,INC., South Korea )
  • C. Lim ( Hynix Semiconductor,INC., South Korea )
  • H. Kim ( Hynix Semiconductor,INC., South Korea )
  • S. Moon ( Hynix Semiconductor,INC., South Korea )
Publication title:
Metrology, inspection, and process control for microlithography XXII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6922
Pub. date:
2008
Vol.:
2
Page(from):
69222T-1
Page(to):
69222T-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471079 [0819471070]
Language:
English
Call no.:
P63600/6922
Type:
Conference Proceedings

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