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Systematic defect inspection and verification for distributions of critical dimension in OPC models utilizing design based metrology tool

Author(s):
  • J.-G. Park ( Samsung Electronics Co. Ltd., South Korea )
  • S. Lee ( Samsung Electronics Co. Ltd., South Korea )
  • Y.-S. Kang ( Samsung Electronics Co. Ltd., South Korea )
  • Y.-K. Park ( Samsung Electronics Co. Ltd., South Korea )
  • T. Kitamura ( NanoGeometry Research,INC., Japan )
Publication title:
Metrology, inspection, and process control for microlithography XXII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6922
Pub. Year:
2008
Vol.:
2
Page(from):
69222C-1
Page(to):
69222C-9
Pages:
9
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471079 [0819471070]
Language:
English
Call no.:
P63600/6922
Type:
Conference Proceedings

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