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Overlay improvement by zone alignment strategy

Author(s):
  • C.-Y. Huang ( Nanya Technology Corp., Taiwan )
  • A.-Y. Lee ( Nanya Technology Corp., Taiwan )
  • C.-L. Shih ( Nanya Technology Corp., Taiwan )
  • R. Yang ( lnotera Memories,INC., Taiwan )
  • M. Yuan ( lnotera Memories,INC., Taiwan )
Publication title:
Metrology, inspection, and process control for microlithography XXII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6922
Pub. Year:
2008
Vol.:
1
Page(from):
69221G-1
Page(to):
69221G-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471079 [0819471070]
Language:
English
Call no.:
P63600/6922
Type:
Conference Proceedings

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