CD uniformity control via real-time control of photoresist properties

CD uniformity control via real-time control of photoresist properties

Author(s):

M. Chen ( National Univ. of Singapore, Singapore )
J. Fu ( National Univ. of Singapore, Singapore )
W. K. Ho ( National Univ. of Singapore, Singapore )
A. Tay ( National Univ. of Singapore, Singapore )

Publication title:

Metrology, inspection, and process control for microlithography XXII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6922

Pub. Year:

2008

Vol.:

1

Page(from):

69220Y-1

Page(to):

69220Y-8

Pages:

8

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471079 [0819471070]

Language:

English

Call no.:

P63600/6922

Type:

Conference Proceedings

Details

TDL ID:	ZA00052553
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2008 : 22nd
Conf. info. (Venue):	San Jose, California, USA
Conf. info. (Date):	2008.02.25-2008.02.28
Note for article:	Metrology, inspection, and process control for microlithography XXII, San Jose, California, USA, 25-28 February 2008 - Session 7. Process Control (69220Y/6922-32)

Similar Items:

1 Conference Proceedings Real-time control of photoresist absorption coefficient uniformity Tay, A., Ho, W. -K., Wu, X., Tsai, K. -Y. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Iterative Feedback Tuning Control of Photoresist Film Thickness Uniformity Ying Zhou, Weng-Khuen Ho, Arthur Tay, Jiewen Deng, Boon-Keng Lok American Institute of Chemical Engineers
2 Conference Proceedings Real-time control of photoresist development process Tay, A., Ho, W. -K., Kiew, C. -M., Zhou, Y., Lee, J. H. SPIE - The International Society of Optical Engineering	8 Conference Proceedings Real-time process control to prevent CD variation induced by postexposure delay Ku,C.-Y., Lei,T.F., Shieh,J.-M., Chiou,T.-B., Chen,Y.-C. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Real-time spatial control of photoresist development rate A. Tay, W. Ho, N. Hu, C. Kiew, K. Tsai SPIE - The International Society of Optical Engineering	9 Conference Proceedings Teleconsultation via a wide area network in real time and by electronic mail Z. Jiang, J.T. Chao, W. Chao, K. Chang, B.K. Ho Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography [6155-08] Tay, A., Ho, W. -K., Hu, N., Tsai, K.Y., Zhou, Y. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Improving RIE Process Rohusiness via Real-Time Feedback Control Fercudenbcrg, J.W., Llia, M.E., Grizzle, J.S., Khargonekar, P.P., Terry, F.L., Jr. Electrochemical Society
5 Conference Proceedings Minimum-time optimal feedforward control of conductive heating systems for microelectronics processing of silicon wafers and quartz photomasks Ho,W.K., Tay,A. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Global CD uniformity improvement in mask manufacturing for advanced lithography Chang, S.-M., Chin, C.C., Wang, W.-C., Lu, C.-L., Hsieh, R.-G., Tsay, C.-S., Yen, Y.-S., Chin, S.-C., Lee, H.-C., Liu, … SPIE - The International Society of Optical Engineering
6 Conference Proceedings Real-time control of photoresist thickness uniformity during the bake process Lee,L.L., Schaper,C.D., Khuen,H.W. SPIE-The International Society for Optical Engineering	12 Conference Proceedings In-situ Measurement and Control for Photoresist Processing in Microlithography Arthur Tay, Weng-Khuen Ho, Xiaodong Wu, Choon-Meng Kiew American Institute of Chemical Engineers

1

2

3

4

5

6

7

8

9

10

11

12