Blank Cover Image

Impact of sampling on uncertainty: semiconductor dimensional metrology applications

Author(s):
Publication title:
Metrology, inspection, and process control for microlithography XXII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6922
Pub. Year:
2008
Vol.:
1
Page(from):
69220X-1
Page(to):
69220X-22
Pages:
22
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471079 [0819471070]
Language:
English
Call no.:
P63600/6922
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Metrology tool fleet management: applying FMP tool matching and monitoring concepts to an overlay fleet [6152-38]

Morningstar, J., Solecky, E., Archie, C., Banke, B.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis

Sendelbach, M., Archie, C.N., Banke, B., Mayer, J., Nii, H., Herrera, P., Hankinson, M.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Realizing value-added metrology

B. Bunday, P. Lipscomb, J. Allgair, D. Patel, M. Caldwell, E. Solecky, C. Archie, J. Morningstar, B. J. Rice, B. Singh, …

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Improvement in total measurement uncertainty for gate CD control [5878-24]

Bunday, B. D., Sirjgabu, O., Wen, Y., Paranipe, A., Terbeek, P., Allgair, J., Peterson, A.,

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology

Banke, B., Archie, C.N., Sendelbach, M., Robert, J., Slinkman, J.A., Kaszuba, P., Kontra, R., DeVries, M., Solecky, E.P.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Fundamental limits of optical critical dimension metrology: a simulation study

R. Silver, T. Germer, R. Attota, B. M. Barnes, B. Bunday, J. Allgair, E. Marx, J. Jun

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Three-dimensional top-down metrology: a viable alternative to AFM or cross-section?

Solecky,E.P., Archie,C.N., Hayes,T.S., Banke,G.W., Cornell,R.S.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Dimensional metrology of resist lines using a SEM model-based library approach

Villarrubia, J.S., Vladar, A.E., Bunday, B.D., Bishop, M.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Accuracy considerations for critical dimension semiconductor metrology

N. G. Orji, R. G. Dixson, B. D. Bunday, J. A. Allgair

Society of Photo-optical Instrumentation Engineers
11 Conference Proceedings Total measurement uncertainty and total process precision evaluation of a structural metrology approach to monitoring post-CMP processes

Lu, W., Archie, C.N., Stone, S., Kang, H.H., Chitturi, P.R.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Characteristics of accuracy for CD metrology

G. W. Banke, Jr., Charles N. Archie

SPIE - The International Society of Optical Engineering
12 Conference Proceedings The coming of age of tilt CD-SEM

B. Bunday, J. Allgair, E. Solecky, C. Archie, N. G. Orji, J. Beach, O. Adan, R. Peltinov, M. Bar-zvi, J. Swyers

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12