Blank Cover Image

Overlay measurement based on dual-overlay grating image

Author(s):
  • D.-M. Shyu ( Industrial Technology Research Institute, Taiwan )
  • Y. Ku ( Industrial Technology Research Institute, Taiwan )
  • S.-P. Dong ( Industrial Technology Research Institute, Taiwan )
Publication title:
Metrology, inspection, and process control for microlithography XXII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6922
Pub. Year:
2008
Vol.:
1
Page(from):
69220Q-1
Page(to):
69220Q-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471079 [0819471070]
Language:
English
Call no.:
P63600/6922
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Optimal measurement method for diffraction-based overlay metrology

W.-T. Hsu, Y.-S. Ku

Society of Photo-optical Instrumentation Engineers
7 Conference Proceedings Efficiency variations of UVCS/SOHO based on laboratory measurements of replica gratings

Gardner,L.D., Atkins,N., Fineschi,S., Smith,P.L., Kohl,J.L., Maccari,L., Romoli,M.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Angular scatterometry for line-width roughness measurement

D. Shyu, Y. Ku, N. Smith

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Evaluation of overlay measurement target designs for Cu dual-damascene process

Mukherjee-Roy,M., Kumar,R., Samudra,G.S.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Influence of semiconductor manufacturing process variation on device parameter measurement for angular scatterometry [6152-56]

Wang, S. C., Ku, Y. S., Shyu, D. M., Ko, C. H., Smith, N.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Optical fiber long-period grating-based Cu2= measurement [6019-76]

Dong S., Liu Y., Tan X., Liao Y., Tian Q., Luo M.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings In-chip overlay metrology of 45nm and 55nm processes

Y. S. Ku, C. H. Tung, Y. P. Li, H. L. Pang, C. M. Ke, Y. H. Wang, D. C. Huang, N. P. Smith, L. Binns

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Diffraction based overlay metrology: accuracy and performance on front end stack

P. Leray, S. Cheng, D. Kandel, M. Adel, A. Marchelli

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Specifications, methodologies, and results of evaluation of optical critical dimension scatterometer tools at the 90nm CMOS technology node and beyond

Ko, C.-H., Ku, Y., Smith, N., Shyu, D.-M., Wang, S.-C., Lu, S.-H.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Multi-wavelength SOA-fiber laser with versatile multichannel filters based on fiber Bragg gratings [6351-94]

Moon, D> S., Han, Y.-G., Dong, X., Shum, P., Chung, Y.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Bragg grating dual fiber laser system for measurement of strain

M. D. Sanchez, G. B. Perez, J. Castillo-M, S. M. Aguirre

SPIE - The International Society of Optical Engineering
12 Conference Proceedings In-chip overlay metrology for 45nm processes

Y. S. Ku, H. L. Pang, N. P. Smith, L. Binns

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12