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Using in-chip overlay metrology

Author(s):
  • S. Girol-Gunia ( AMD Fob 36 LLC and Co. KG, Germany )
  • B. Schulz ( AMD Fob 36 LLC and Co. KG, Germany )
  • N. Smith ( Nanometrics,Inc., United Kingdom )
  • L. Binns ( Nanometrics,Inc., United Kingdom )
Publication title:
Metrology, inspection, and process control for microlithography XXII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6922
Pub. Year:
2008
Vol.:
1
Page(from):
69220N-1
Page(to):
69220N-12
Pages:
12
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471079 [0819471070]
Language:
English
Call no.:
P63600/6922
Type:
Conference Proceedings

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