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Plasma cleaning of nanoparticles from EUV mask materials by electrostatics

Author(s):
  • W. M. Lytle ( Univ. of Illinois at Urbana- Champaign, USA )
  • R. Raju ( Univ. of Illinois at Urbana- Champaign, USA )
  • H. Shin ( Univ. of Illinois at Urbana- Champaign, USA )
  • C. Das ( Univ. of Illinois at Urbana- Champaign, USA )
  • M. J. Neumann ( Univ. of Illinois at Urbana- Champaign, USA )
Publication title:
Metrology, inspection, and process control for microlithography XXII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6922
Pub. date:
2008
Vol.:
1
Page(from):
69220D-1
Page(to):
69220D-9
Pages:
9
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471079 [0819471070]
Language:
English
Call no.:
P63600/6922
Type:
Conference Proceedings

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