Plasma cleaning of nanoparticles from EUV mask materials by electrostatics

Plasma cleaning of nanoparticles from EUV mask materials by electrostatics

Author(s):

W. M. Lytle ( Univ. of Illinois at Urbana- Champaign, USA )
R. Raju ( Univ. of Illinois at Urbana- Champaign, USA )
H. Shin ( Univ. of Illinois at Urbana- Champaign, USA )
C. Das ( Univ. of Illinois at Urbana- Champaign, USA )
M. J. Neumann ( Univ. of Illinois at Urbana- Champaign, USA )

Publication title:

Metrology, inspection, and process control for microlithography XXII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6922

Pub. Year:

2008

Vol.:

1

Page(from):

69220D-1

Page(to):

69220D-9

Pages:

9

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471079 [0819471070]

Language:

English

Call no.:

P63600/6922

Type:

Conference Proceedings

Details

TDL ID:	ZA00052553
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2008 : 22nd
Conf. info. (Venue):	San Jose, California, USA
Conf. info. (Date):	2008.02.25-2008.02.28
Note for article:	Metrology, inspection, and process control for microlithography XXII, San Jose, California, USA, 25-28 February 2008 - Session 3. Methods for Tomorrow (69220D/6922-12)

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