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The study of attenuated PSM structure for extreme ultraviolet lithography with minimized mask shadowing effect

Author(s):
Publication title:
Emerging lithographic technologies XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6921
Pub. Year:
2008
Vol.:
2
Page(from):
69213Q-1
Page(to):
69213Q-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471062 [0819471062]
Language:
English
Call no.:
P63600/6921
Type:
Conference Proceedings

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