Benchmarking of commercial EUVL resists at SEMATECH

Benchmarking of commercial EUVL resists at SEMATECH

Author(s):

A. Ma ( Lawrence Berkeley National Lab., USA )
J. Park ( Lawrence Berkeley National Lab., USA )
K. Dean ( Lawrence Berkeley National Lab., USA )
S. Wurm ( SEMATECH,Inc., USA )
P. Naulleau ( Lawrence Berkeley National Lab., USA )

Publication title:

Emerging lithographic technologies XII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6921

Pub. Year:

2008

Vol.:

2

Page(from):

69213O-1

Page(to):

69213O-9

Pages:

9

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471062 [0819471062]

Language:

English

Call no.:

P63600/6921

Type:

Conference Proceedings

Details

TDL ID:	ZA00052552
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2008 : 12th
Conf. info. (Venue):	San Jose, California, USA
Conf. info. (Date):	2008.02.26-2008.02.28
Note for article:	Emerging lithographic technologies XII, San Jose, California, USA, 26-28 February 2008 - Poster Session: EUV Resist (69213O/6921-137)

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