Ionic debris assessment of various EUVL systems

Ionic debris assessment of various EUVL systems

Author(s):

C. H. Castano ( Univ. of Illinois at Urbana-Champaign, USA )
D. N. Ruzic ( Univ. of Illinois at Urbana-Champaign, USA )
S. N. Srivastava ( Univ. of Illinois at Urbana-Champaign, USA )
K. C. Thompson ( Univ. of Illinois at Urbana-Champaign, USA )
J. Sporre ( Univ. of Illinois at Urbana-Champaign, USA )

Publication title:

Emerging lithographic technologies XII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6921

Pub. Year:

2008

Vol.:

2

Page(from):

692137-1

Page(to):

692137-13

Pages:

13

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471062 [0819471062]

Language:

English

Call no.:

P63600/6921

Type:

Conference Proceedings

Details

TDL ID:	ZA00052552
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2008 : 12th
Conf. info. (Venue):	San Jose, California, USA
Conf. info. (Date):	2008.02.26-2008.02.28
Note for article:	Emerging lithographic technologies XII, San Jose, California, USA, 26-28 February 2008 - Poster Session: EUV Contamination (692137/6921-120)

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