EUV pattern shift compensation strategies

EUV pattern shift compensation strategies

Author(s):

T. Schmoeller ( T. KlimpeL Synopsys,Inc., Germany )
I. Kim ( IMEC, Belgium )
G. F. Lorusso ( IMEC, Belgium )
A. Myers ( IMEC, Belgium )
R. Jonckheere ( IMEC, Belgium )

Publication title:

Emerging lithographic technologies XII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6921

Pub. Year:

2008

Vol.:

1

Page(from):

69211B-1

Page(to):

69211B-8

Pages:

8

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471062 [0819471062]

Language:

English

Call no.:

P63600/6921

Type:

Conference Proceedings

Details

TDL ID:	ZA00052552
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2008 : 12th
Conf. info. (Venue):	San Jose, California, USA
Conf. info. (Date):	2008.02.26-2008.02.28
Note for article:	Emerging lithographic technologies XII, San Jose, California, USA, 26-28 February 2008 - Session 9. EUV Imaging (69211B/6921-46)

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