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Lifetime of EUVL as a function of degree of carbon contamination and capping materials

Author(s):
  • S. Huh ( Samsung Electronics Co., Ltd., South Korea )
  • H. Kim ( Samsung Electronics Co., Ltd., South Korea )
  • G. Yoon ( Samsung Electronics Co., Ltd., South Korea )
  • J. Choi ( Samsung Electronics Co., Ltd., South Korea )
  • H.-S. Lee ( Samsung Electronics Co., Ltd., South Korea )
Publication title:
Emerging lithographic technologies XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6921
Pub. Year:
2008
Vol.:
1
Page(from):
692115-1
Page(to):
692115-9
Pages:
9
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471062 [0819471062]
Language:
English
Call no.:
P63600/6921
Type:
Conference Proceedings

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