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The effect of KOH and KOH/IPA etching on the surface roughness of the silicon mold used for polymer waveguide imprinting

Author(s):
Publication title:
Optoelectronic integrated circuits X : 21-23 January 2008, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6897
Pub. Year:
2008
Page(from):
689717-1
Page(to):
689717-7
Pages:
7
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819470720 [0819470724]
Language:
English
Call no.:
P63600/6897
Type:
Conference Proceedings

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