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Design of maskless lithography system based on DMD

Author(s):
  • J. Ma ( Xi'an Univ. of Technology, China )
  • X. Du ( Xi'an Univ. of Technology, China )
  • Y. Liu ( Xi'an Univ. of Technology, China )
Publication title:
MEMS/MOEMS technologies and applications III : 12-14 November 2007, Beijing, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6836
Pub. Year:
2008
Page(from):
683612-1
Page(to):
683612-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819470119 [0819470112]
Language:
English
Call no.:
P63600/6836
Type:
Conference Proceedings

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