Analysis of thermal stress damage in single-crystal silicon induced by 1064-nm long-pulse laser

Analysis of thermal stress damage in single-crystal silicon induced by 1064-nm long-pulse laser

Author(s):

Y. Chen ( univ. of science and Technology, china )
J. Lu ( univ. of science and Technology, china )
X. Ni ( univ. of science and Technology, china )

Publication title:

Infrared materials, devices, and applications : 12-15 November 2007, Beijing, China

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6835

Pub. Year:

2008

Page(from):

68351X-1

Page(to):

68351X-7

Pages:

7

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819470102 [0819470104]

Language:

English

Call no.:

P63600/6835

Type:

Conference Proceedings

Details

TDL ID:	ZA00052466
Series ID:	PA00000029
Conf. info. (Name):	Photonics Asia : Infrared Materials, Devices, and Applications
Conf. info. (Number):	2007
Conf. info. (Venue):	Beijing, China
Conf. info. (Date):	2007.11.12-2007.11.15
Note for article:	Infrared materials, devices, and applications, 12-15 November 2007, Beijing, China - Poster Session (68351X/6835-87)

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