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Reactive ion beam etching of multilayer diffraction gratings with SiO2 as the top layer

Author(s):
  • Y. Liu ( Univ. of Science and Technology of China, China )
  • X. Xu ( Univ. of Science and Technology of China, China )
  • Y. Hong ( Univ. of Science and Technology of China, China )
  • D. Xu ( Univ. of Science and Technology of China, China )
  • S. Fu ( Univ. of Science and Technology of China, China )
Publication title:
Holography and diffractive optics III : 12-14 November 2007, Beijing, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6832
Pub. Year:
2008
Page(from):
68322O-1
Page(to):
68322O-5
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819470072 [0819470074]
Language:
English
Call no.:
P63600/6832
Type:
Conference Proceedings

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