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Study on the fabrication of low-gradient photoresist grating masks

Author(s):
  • Q. Liu ( Soochow Univ., China )
  • H. Wan ( People's Liberation Army, China )
  • J. Wu ( Soochow Univ., China )
  • X. Chen ( Soochow Univ., China )
  • C. Li ( Soochow Univ., China )
Publication title:
Holography and diffractive optics III : 12-14 November 2007, Beijing, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6832
Pub. Year:
2008
Page(from):
68320X-1
Page(to):
68320X-7
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819470072 [0819470074]
Language:
English
Call no.:
P63600/6832
Type:
Conference Proceedings

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