Layout optimization for thick-film resist overlay metrology
- Author(s):
- L. Zhu ( Shanghai Institute of Microsystem And Information Technology, China )
- J. Li ( Grace Semiconductor Manufacturing Corp., China )
- B. Zhou ( Grace Semiconductor Manufacturing Corp., China )
- Y. Gu ( Grace Semiconductor Manufacturing Corp., China )
- S. Yang ( Grace Semiconductor Manufacturing Corp., China )
- Publication title:
- Quantum optics, optical data storage, and advanced microlithography : 12-14 November 2007, Beijing, China
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6827
- Pub. Year:
- 2008
- Pt.:
- C
- Page(from):
- 682726-1
- Page(to):
- 682726-8
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819470027 [0819470023]
- Language:
- English
- Call no.:
- P63600/6827
- Type:
- Conference Proceedings
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