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Layout optimization for thick-film resist overlay metrology

Author(s):
  • L. Zhu ( Shanghai Institute of Microsystem And Information Technology, China )
  • J. Li ( Grace Semiconductor Manufacturing Corp., China )
  • B. Zhou ( Grace Semiconductor Manufacturing Corp., China )
  • Y. Gu ( Grace Semiconductor Manufacturing Corp., China )
  • S. Yang ( Grace Semiconductor Manufacturing Corp., China )
Publication title:
Quantum optics, optical data storage, and advanced microlithography : 12-14 November 2007, Beijing, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6827
Pub. Year:
2008
Pt.:
C
Page(from):
682726-1
Page(to):
682726-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819470027 [0819470023]
Language:
English
Call no.:
P63600/6827
Type:
Conference Proceedings

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