Fabrication of smooth 45° micromirror using TMAH low concentration solution with NCW-601A surfactant on 100 silicon

Fabrication of smooth 45° micromirror using TMAH low concentration solution with NCW-601A surfactant on ‹100› silicon

Author(s):

Y. W. Xu ( Univ. of New South Wales, Australia )
A. Michael ( Univ. of New South Wales, Australia )
C. Y. Kwok ( Univ. of New South Wales, Australia )

Publication title:

Device and process technologies for microelectronics, MEMS, photonics, and nanotechnology IV : 5-7 December 2007, Canberra, Australia

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6800

Pub. Year:

2008

Page(from):

68001W-1

Page(to):

68001W-9

Pages:

9

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819469717 [0819469718]

Language:

English

Call no.:

P63600/6800

Type:

Conference Proceedings

Details

TDL ID:	ZA00052431
Series ID:	PA00000029
Conf. info. (Name):	Smart Materials, Nano-, and Micro- Smart Systems : Device and Process Technologies for Microelectronics, MEMS, Photonics, and Nanotechnology
Conf. info. (Number):	2007 : 4th
Conf. info. (Venue):	Canberra, Australia
Conf. info. (Date):	2007.12.05-2007.12.07
Note for article:	Device and process technologies for microelectronics, MEMS, photonics, and nanotechnology IV, 5-7 December 2007, Canberra, Australia - Poster Session (6800-76)

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