EUV mask process development using DUV inspection system

EUV mask process development using DUV inspection system

Author(s):

D. Kim ( KLA-Tencor Corp., USA )
V. Vellanki ( KLA-Tencor Corp., USA )
W. Huang ( KLA-Tencor Corp., USA )
A. Cao ( KLA-Tencor Corp., USA )
C. Chen ( KLA-Tencor Corp., USA )

Publication title:

Photomask technology 2007

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6730

Pub. Year:

2007

Vol.:

3

Page(from):

67305M-1

Page(to):

67305M-8

Pages:

8

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

Language:

English

Call no.:

P63600/6730

Type:

Conference Proceedings

Details

TDL ID:	ZA00052371
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Photomask Technology 2007
Conf. info. (Number):	2007
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2007.09.18-2007.09.21
Note for article:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Poster session: EUV and other generation lithography (6730-207)

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