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The study for close correlation of mask and wafer to optimize wafer field CD uniformity

Author(s):
  • M. Kim ( Hynix Semiconductor, South Korea )
  • J. Kang ( Hynix Semiconductor, South Korea )
  • S. Kang ( Hynix Semiconductor, South Korea )
  • G. Jeong ( Hynix Semiconductor, South Korea )
  • Y. Choi ( Hynix Semiconductor, South Korea )
Publication title:
Photomask technology 2007
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6730
Pub. Year:
2007
Vol.:
3
Page(from):
67304V-1
Page(to):
67304V-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819468871 [0819468878]
Language:
English
Call no.:
P63600/6730
Type:
Conference Proceedings

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