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Mask calibration dominated methodology for OPC matching

Author(s):
  • L. Zhu ( Shanghai Institute of Microsystem and Information Technology, China )
  • M. Lu ( Grace Semiconductor Manufacturing Corp., China )
  • D. King ( Grace Semiconductor Manufacturing Corp., China )
  • Y. Gu ( Grace Semiconductor Manufacturing Corp., China )
  • S. Yang ( Grace Semiconductor Manufacturing Corp., China )
Publication title:
Photomask technology 2007
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6730
Pub. Year:
2007
Vol.:
3
Page(from):
67304D-1
Page(to):
67304D-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819468871 [0819468878]
Language:
English
Call no.:
P63600/6730
Type:
Conference Proceedings

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