Mask calibration dominated methodology for OPC matching
- Author(s):
- L. Zhu ( Shanghai Institute of Microsystem and Information Technology, China )
- M. Lu ( Grace Semiconductor Manufacturing Corp., China )
- D. King ( Grace Semiconductor Manufacturing Corp., China )
- Y. Gu ( Grace Semiconductor Manufacturing Corp., China )
- S. Yang ( Grace Semiconductor Manufacturing Corp., China )
- Publication title:
- Photomask technology 2007
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6730
- Pub. Year:
- 2007
- Vol.:
- 3
- Page(from):
- 67304D-1
- Page(to):
- 67304D-8
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819468871 [0819468878]
- Language:
- English
- Call no.:
- P63600/6730
- Type:
- Conference Proceedings
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