Teracomputing for mask data preparation

Teracomputing for mask data preparation

Author(s):

J. Nogatch ( Synopsys, Inc., USA )
H. Kirsch ( Synopsys, Inc., USA )
K. Mostafa ( Synopsys, Inc., USA )
G. Newell ( Synopsys, Inc., USA )
J. Yeap ( Synopsys, Inc., USA )

Publication title:

Photomask technology 2007

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6730

Pub. Year:

2007

Vol.:

2

Page(from):

67303G-1

Page(to):

67303G-10

Pages:

10

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

Language:

English

Call no.:

P63600/6730

Type:

Conference Proceedings

Details

TDL ID:	ZA00052371
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Photomask Technology 2007
Conf. info. (Number):	2007
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2007.09.18-2007.09.21
Note for article:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Session 23. MDP (6730-120)

Similar Items:

1 Conference Proceedings Advanced mask data processing for 32nm and beyond J. Nogatch, D. Hung, R. Kondepudy, J. Yeap Society of Photo-optical Instrumentation Engineers	7 Conference Proceedings Data fusion for 3D object reconstruction Mostafa, Mostafa G.-H., Yamany, Sameh M., Farag, Aly A. SPIE
2 Conference Proceedings Data exploder for variable shaped beam exposure J. Nogatch, H. Kirsch, J. Shi SPIE - The International Society of Optical Engineering	8 Conference Proceedings SURFACE PREPARATION ISSUES ASSOCIATED WITH HIGH-к/METAL GATE DEVICES J. Bamett, N. Moumen, J. J. Peterson, P. Kirsch, A. Neugroschel, G. Bersuker, H . R. Huff Electrochemical Society
3 Conference Proceedings Integration of OPC and mask data preparation for reduced data I/O and reduced cycle time R. Morgan, M. Chacko, D. Hung, J. Yeap, M. Boman Society of Photo-optical Instrumentation Engineers	9 Conference Proceedings Efficient mask data preparation for variable shaped e-beam writing system focusing on memory devices Jang, T.H., Lee, J.-B., Shin, J.-P., Yoo, K.-J., Jung, D.-H., Park, Y.-H., Yoo, M.-H., Kong, J.-T. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Investigation of an enhanced mask data preparation system using unified mask data formats Suzuki, T., Kuriyama, K., Hirumi, J., Yoshioka, N., Kawase, H., Kamimoto, T. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Hierarchical mask data preparation and special fracturing techniques in MGS Burger,B., Batz,U., Kunze,K., Wolf,H. SPIE - The International Society for Optical Engineering
5 Conference Proceedings Optimized distributed computing environment for mask data preparation [5992-41] Ahn, B. -S., Bang, J. -M., Ji, M. -K., Kang, S., Jang, S. -H., Choi, Y. -H., Ki, W. -T., Choi, S. -W., Han, W. -S. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Elements of hierarchical mask data preparation Kalus, C.K., Simecek, M. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Incorporation of laser proximity correction into mask production Rosenbusch,A., Unruh,J., Kirsch,H., Chan,D. SPIE - The International Society for Optical Engineering	12 Conference Proceedings Integration of OPC and mask data preparation Schulze, S.F., LaCour, P.J., Rodriguez, N. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12