Photomask applications of traceable atomic force microscope dimensional metrology at NIST

Author(s):

• R. Dixson ( National Institute of Standards and Technology, USA )
• N. G. Orji ( National Institute of Standards and Technology, USA )
• J. Potzick ( National Institute of Standards and Technology, USA )
• J. Fu ( National Institute of Standards and Technology, USA )
• R. A. Allen ( National Institute of Standards and Technology, USA )

Publication title:

Photomask technology 2007

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6730

Pub. Year:

2007

Vol.:

2

Page(from):

67303D-1

Page(to):

67303D-13

Pages:

13

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

Language:

English

Call no.:

P63600/6730

Type:

Conference Proceedings