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2D measurement using CD SEM for arbitrarily shaped patterns

Author(s):
  • H.-J. Lee ( Samsung Electronics Co., Ltd., South Korea )
  • S.-Y. Bae ( Samsung Electronics Co., Ltd., South Korea )
  • D.-H. Chung ( Samsung Electronics Co., Ltd., South Korea )
  • S.-G. Woo ( Samsung Electronics Co., Ltd., South Korea )
  • H. Cho ( Samsung Electronics Co., Ltd., South Korea )
Publication title:
Photomask technology 2007
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6730
Pub. Year:
2007
Vol.:
2
Page(from):
673037-1
Page(to):
673037-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819468871 [0819468878]
Language:
English
Call no.:
P63600/6730
Type:
Conference Proceedings

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