Accuracy of mask pattern contour extraction with fine-pixel SEM images

Author(s):

• S. Yamaguchi ( Toshiba Corp., Japan )
• E. Yamanaka ( Toshiba Corp., Japan )
• H. Mukai ( Toshiba Corp., Japan )
• T. Kotani ( Toshiba Corp., Japan )
• H. Mashita ( Toshiba Corp., Japan )

Publication title:

Photomask technology 2007

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6730

Pub. Year:

2007

Vol.:

2

Page(from):

673036-1

Page(to):

673036-12

Pages:

12

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

Language:

English

Call no.:

P63600/6730

Type:

Conference Proceedings