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Improvement of mask CD uniformity for below 45-nm node technology

Author(s):
  • H. Lee ( Samsung Electronics Co., Ltd., South Korea )
  • S. Bae ( Samsung Electronics Co., Ltd., South Korea )
  • J. Park ( Samsung Electronics Co., Ltd., South Korea )
  • D. Nam ( Samsung Electronics Co., Ltd., South Korea )
  • B. Kim ( Samsung Electronics Co., Ltd., South Korea )
Publication title:
Photomask technology 2007
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6730
Pub. date:
2007
Vol.:
2
Page(from):
67302Z-1
Page(to):
67302Z-7
Pages:
7
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819468871 [0819468878]
Language:
English
Call no.:
P63600/6730
Type:
Conference Proceedings

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