Selective process aware OPC for memory device
- Author(s):
- W. Shim ( Samsung Electronics Co., Ltd., South Korea )
- S. Suh ( Samsung Electronics Co., Ltd., South Korea )
- F. Amoroso ( Synopsys, Inc., USA )
- R. Lugg ( Synopsys, Inc., USA )
- S. Lee ( Synopsys, Inc., USA )
- Publication title:
- Photomask technology 2007
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6730
- Pub. Year:
- 2007
- Vol.:
- 2
- Page(from):
- 67302P-1
- Page(to):
- 67302P-10
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819468871 [0819468878]
- Language:
- English
- Call no.:
- P63600/6730
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Fracture friendly optical proximity correction for non-Manhattan features [6283-60]
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
5
Conference Proceedings
OPC in memory-device patterns using boundary layer model for 3-dimensional mask topographic effect
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Maintaining lithographic quality during OPC for low-k1 and MEEF processes constrained by mask dimensional rules
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Three-dimensional mask effect approximate modeling for sub-50-nm node device OPC
SPIE - The International Society of Optical Engineering |