Repairing 45 nm node defects through nano-machining
- Author(s):
- R. White ( RAVE LLC, USA )
- A. Dinsdale ( RAVE LLC, USA )
- T. Robinson ( RAVE LLC, USA )
- D. Brinkley ( RAVE LLC, USA )
- J. Csuy ( RAVE LLC, USA )
- Publication title:
- Photomask technology 2007
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6730
- Pub. Year:
- 2007
- Vol.:
- 2
- Page(from):
- 673021-1
- Page(to):
- 673021-11
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819468871 [0819468878]
- Language:
- English
- Call no.:
- P63600/6730
- Type:
- Conference Proceedings
Similar Items:
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Application of photolithographic simulation and a mask repair system in a production environment [6283-45]
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Precise and high-throughput femtopulse laser mask repair of large defects [6349-171]
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Phase-shifting photomask repair and repair validation procedure for transparent and opaque defects relevant for the 45nm node and beyond
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Mask repair technique assessment and development for the 45 nm lithography node [6283-109]
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
11
Conference Proceedings
Nanoscale dimensional focused ion beam repair of quartz defects on 90-nm node alternating aperture phase shift masks
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Use of nanomachining for subtractive repair of EUV and other challenging mask defects
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Correlation of inspection methods in characterizing nanomachined photomask repairs
SPIE - The International Society of Optical Engineering |