Polarization aberration modeling via Jones matrix in the context of OPC

Author(s):

• Q. Zhang ( Synopsys, Inc., USA )
• H. Song ( Synopsys, Inc., USA )
• K. Lucas ( Synopsys, Inc., USA )

Publication title:

Photomask technology 2007

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6730

Pub. Year:

2007

Vol.:

1

Page(from):

67301Q-1

Page(to):

67301Q-11

Pages:

11

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

Language:

English

Call no.:

P63600/6730

Type:

Conference Proceedings