Requirements of photomask registration for the 45nm node and beyond: Is it possible?
- Author(s):
- J. Choi ( Samsung Electronics Co., Ltd., South Korea )
- H. B. Kim ( Samsung Electronics Co., Ltd., South Korea )
- S. H. Lee ( Samsung Electronics Co., Ltd., South Korea )
- D. H. Lee ( Samsung Electronics Co., Ltd., South Korea )
- H. Y. Jeong ( Samsung Electronics Co., Ltd., South Korea )
- Publication title:
- Photomask technology 2007
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6730
- Pub. Year:
- 2007
- Vol.:
- 1
- Page(from):
- 67301O-1
- Page(to):
- 67301O-10
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819468871 [0819468878]
- Language:
- English
- Call no.:
- P63600/6730
- Type:
- Conference Proceedings
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